ULSI Technology
ULSI Technology By C. Y. Chang, S. M. Sze
Publisher: Mc/graw-Hill 1996 | 726 Pages | ISBN: 0070630623 | DJVU | 7 MB
Publisher: Mc/graw-Hill 1996 | 726 Pages | ISBN: 0070630623 | DJVU | 7 MB
This text follows the tradition of Sze's highly successful pioneering text on VLSI technology and is updated with the latest advances in the field of microelectronic chip fabrication. Since computer chips are foundations of modern electronics, these topics are essential for the next generation of USLI technologies, allowing more transistors to be packaged on a single chip. Contributing to each chapter are industry experts, specializing in topics such as epitaxy with low temperature process, rapid thermal processes, low damage plasma reactive ion etching, fine line litography, cleaning technology, clean room technology, packing and reliability.
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